Silicon sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
040891.KS / 1EACH
CAS:7440-21-3
Tantalum sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Nb)
040894.KS / 1EACH
CAS:7440-25-7
Tantalum sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Nb)
040894.KS / 1EACH
CAS:7440-25-7
Tantalum sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Nb)
040896.KS / 1EACH
CAS:7440-25-7
Tin sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.995% (metals basis)
040898.KS / 1EACH
CAS:7440-31-5
Tin sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis)
040899.KS / 1EACH
CAS:7440-31-5
Tin sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.995% (metals basis)
040900.KS / 1EACH
CAS:7440-31-5
Tin sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis)
040901.KS / 1EACH
CAS:7440-31-5
Titanium sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.7% (metals basis)
040902.KS / 1EACH
CAS:7440-32-6
Titanium sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.7% (metals basis)
040903.KS / 1EACH
CAS:7440-32-6
Aluminum Magnesium gauze, alloy 5056, 30 mesh woven from 0.23mm (0.009in) dia wire
040906.GT / 150X150MM
Aluminum Magnesium gauze, alloy 5056, 30 mesh woven from 0.23mm (0.009in) dia wire
040906.HB / 300X300MM
Molybdenum gauze, 50 mesh woven from 0.0509mm (0.002in) dia wire
040911.GT / 150X150MM
CAS:7439-98-7
Molybdenum gauze, 50 mesh woven from 0.0509mm (0.002in) dia wire
040911.HB / 300X300MM
CAS:7439-98-7
Molybdenum gauze, 100 mesh woven from 0.0636mm (0.0025in) dia wire
040912.FL / 75X75MM
CAS:7439-98-7
Molybdenum gauze, 100 mesh woven from 0.0636mm (0.0025in) dia wire
040912.GT / 150X150MM
CAS:7439-98-7
Molybdenum gauze, 100 mesh woven from 0.0636mm (0.0025in) dia wire
040912.HB / 300X300MM
CAS:7439-98-7