Chemical materials

1-Trityl-1H-imidazole-2-carbaldehyde 97%

1-Trityl-1H-imidazole-2-carbaldehyde 97%

768646 / 1g
CAS No.:67478-50-6
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1-Trityl-1H-imidazole-2-carbaldehyde 97%

1-Trityl-1H-imidazole-2-carbaldehyde 97%

768646 / 250mg
CAS No.:67478-50-6
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3-(Bromomethyl)-5-methyl-1,2,4-oxadiazole 96%

3-(Bromomethyl)-5-methyl-1,2,4-oxadiazole 96%

768648 / 1g
CAS No.:959406-40-7
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3-(Bromomethyl)-5-methyl-1,2,4-oxadiazole 96%

3-(Bromomethyl)-5-methyl-1,2,4-oxadiazole 96%

768648 / 250mg
CAS No.:959406-40-7
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3-(2,3-Difluorophenyl)propanoic acid 95%

3-(2,3-Difluorophenyl)propanoic acid 95%

768650 / 1g
CAS No.:412961-26-3
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3-(2,3-Difluorophenyl)propanoic acid 95%

3-(2,3-Difluorophenyl)propanoic acid 95%

768650 / 250mg
CAS No.:412961-26-3
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(4-Isobutylphenyl)methanol 98%

(4-Isobutylphenyl)methanol 98%

768651 / 1g
CAS No.:110319-85-2
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(4-Isobutylphenyl)methanol 98%

(4-Isobutylphenyl)methanol 98%

768651 / 250mg
CAS No.:110319-85-2
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Ethyl 2,4-dioxo-4-(thiophen-2-yl)butanoate 95%

Ethyl 2,4-dioxo-4-(thiophen-2-yl)butanoate 95%

768652 / 1g
CAS No.:36983-36-5
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Ethyl 2,4-dioxo-4-(thiophen-2-yl)butanoate 95%

Ethyl 2,4-dioxo-4-(thiophen-2-yl)butanoate 95%

768652 / 250mg
CAS No.:36983-36-5
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1-Benzyl-4-phenylpiperidin-4-ol 95%

1-Benzyl-4-phenylpiperidin-4-ol 95%

768653 / 1g
CAS No.:63843-83-4
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1-Benzyl-4-phenylpiperidin-4-ol 95%

1-Benzyl-4-phenylpiperidin-4-ol 95%

768653 / 250mg
CAS No.:63843-83-4
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Palladium 99.9% metals basis,≤1μm

Palladium 99.9% metals basis,≤1μm

768654 / 1g
CAS No.:7440-05-3
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Palladium 99.9% metals basis,≤1μm

Palladium 99.9% metals basis,≤1μm

768654 / 250mg
CAS No.:7440-05-3
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Carbenicillin disodium 適用于植物細胞培養

Carbenicillin disodium 適用于植物細胞培養

768655 / 1g
CAS No.:4800-94-6
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Carbenicillin disodium 適用于植物細胞培養

Carbenicillin disodium 適用于植物細胞培養

768655 / 250mg
CAS No.:4800-94-6
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Carbenicillin disodium 適用于植物細胞培養

Carbenicillin disodium 適用于植物細胞培養

768655 / 5g
CAS No.:4800-94-6
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Dess-Martin Periodinane 8-12% in Dichloromethane

Dess-Martin Periodinane 8-12% in Dichloromethane

768657 / 100ml
CAS No.:87413-09-0
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Dess-Martin Periodinane 8-12% in Dichloromethane

Dess-Martin Periodinane 8-12% in Dichloromethane

768657 / 25ml
CAS No.:87413-09-0
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PEEK 中流動性顆粒, 30%碳纖維

PEEK 中流動性顆粒, 30%碳纖維

768658 / 100g
CAS No.:29658-26-2
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PEEK 中流動性顆粒, 30%碳纖維

PEEK 中流動性顆粒, 30%碳纖維

768658 / 25g
CAS No.:29658-26-2
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Poly(dimethylsiloxane), hydroxy terminated ~65 mPa·s

Poly(dimethylsiloxane), hydroxy terminated ~65 mPa·s

768665 / 100g
CAS No.:70131-67-8
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Poly(dimethylsiloxane), hydroxy terminated ~65 mPa·s
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Poly(methyl vinyl ether-alt-maleic anhydride) average Mw ~1,080,000, average Mn ~311,000
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Poly(methyl vinyl ether-alt-maleic anhydride) average Mw ~1,080,000, average Mn ~311,000
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Poly(methyl vinyl ether-alt-maleic anhydride) average Mw ~1,080,000, average Mn ~311,000
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2-Nitrobenzaldehyde 99.9%

2-Nitrobenzaldehyde 99.9%

768669 / 100g
CAS No.:552-89-6
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2-Nitrobenzaldehyde 99.9%

2-Nitrobenzaldehyde 99.9%

768669 / 25g
CAS No.:552-89-6
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2-Nitrobenzaldehyde 99.9%

2-Nitrobenzaldehyde 99.9%

768669 / 500g
CAS No.:552-89-6
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2-Chloro-3-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)benzonitrile 97%
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2-Chloro-3-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)benzonitrile 97%
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Sodium carbonate monohydrate ≥99%

Sodium carbonate monohydrate ≥99%

768672 / 2.5kg
CAS No.:5968-11-6
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Sodium carbonate monohydrate ≥99%

Sodium carbonate monohydrate ≥99%

768672 / 500g
CAS No.:5968-11-6
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Chlorinated paraffin 含氯量: 29%, 含抑制劑

Chlorinated paraffin 含氯量: 29%, 含抑制劑

768673 / 2.5L
CAS No.:63449-39-8
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Chlorinated paraffin 含氯量: 29%, 含抑制劑

Chlorinated paraffin 含氯量: 29%, 含抑制劑

768673 / 500ml
CAS No.:63449-39-8
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Calcium iodide 超乾級, 99.99% metals basis

Calcium iodide 超乾級, 99.99% metals basis

768676 / 25g
CAS No.:10102-68-8
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Calcium iodide 超乾級, 99.99% metals basis

Calcium iodide 超乾級, 99.99% metals basis

768676 / 5g
CAS No.:10102-68-8
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High-purity ultra-fine tantalum carbide powder  98%, 粒徑; 800-1000nm
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High-purity ultra-fine tantalum carbide powder  98%, 粒徑; 800-1000nm
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High-purity ultra-fine tantalum carbide powder  98%, 粒徑; 400-700nm
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High-purity ultra-fine tantalum carbide powder  98%, 粒徑; 400-700nm
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High-purity ultra-fine tantalum carbide powder  98%, 粒徑; 100-500nm
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High-purity ultra-fine tantalum carbide powder  98%, 粒徑; 100-500nm
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Iron(III) oxyhydroxide 99.5% trace metals basis, aqueous nanoparticle dispersion, <5 nm, 20% wt.% in H2O
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Zirconium carbide ≥98.5%, 200-400nm

Zirconium carbide ≥98.5%, 200-400nm

768682 / 100g
CAS No.:12070-14-3
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Zirconium carbide ≥98.5%, 200-400nm

Zirconium carbide ≥98.5%, 200-400nm

768682 / 25g
CAS No.:12070-14-3
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Zirconium carbide ≥98.5%, 200-400nm

Zirconium carbide ≥98.5%, 200-400nm

768682 / 500g
CAS No.:12070-14-3
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Zirconium carbide ≥98.5%, 200-400nm

Zirconium carbide ≥98.5%, 200-400nm

768682 / 5g
CAS No.:12070-14-3
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Zirconium carbide 98%, 400nm-1μm

Zirconium carbide 98%, 400nm-1μm

768683 / 100g
CAS No.:12070-14-3
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Zirconium carbide 98%, 400nm-1μm

Zirconium carbide 98%, 400nm-1μm

768683 / 25g
CAS No.:12070-14-3
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