Chemical materials

Tert-butyl (4-nitrophenyl) carbonate 95%

Tert-butyl (4-nitrophenyl) carbonate 95%

T697952 / 1MG
CAS No.:13303-10-1
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Tert-butyl (4-nitrophenyl) carbonate 95%

Tert-butyl (4-nitrophenyl) carbonate 95%

T697952 / 5MG
CAS No.:13303-10-1
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Tris(2-nonylphenyl) phosphate 95%

Tris(2-nonylphenyl) phosphate 95%

T697971 / 250MG
CAS No.:26569-53-9
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Tectorigenin 99%

Tectorigenin 99%

T697976 / 250MG
CAS No.:548-77-6
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Tectorigenin 99%

Tectorigenin 99%

T697976 / 1G
CAS No.:548-77-6
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Tris(2,6-dimethylphenyl) phosphate 95%

Tris(2,6-dimethylphenyl) phosphate 95%

T697977 / 100MG
CAS No.:121-06-2
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Tachysterol3 98%

Tachysterol3 98%

T697982 / 5MG
CAS No.:17592-07-3
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Tachysterol3 98%

Tachysterol3 98%

T697982 / 10MG
CAS No.:17592-07-3
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TBS Buffer 20X, pH7.4

TBS Buffer 20X, pH7.4

T697983 / 1L
CAS No.:NONE30040
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TBS Buffer 20X, pH7.4

TBS Buffer 20X, pH7.4

T697983 / 500ML
CAS No.:NONE30040
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Titanium dioxide 99.8% metals basis, 80nm, 金紅, 親油(KH-570處理)
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Titanium dioxide 99.8% metals basis, 80nm, 金紅, 親油(KH-570處理)
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Titanium dioxide 99.8% metals basis, 60nm, 金紅, 親油(KH-570處理)
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Titanium dioxide 99.8% metals basis, 60nm, 金紅, 親油(KH-570處理)
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Titanium dioxide 99.8% metals basis, 40nm, 金紅, 親油(KH-570處理)
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Titanium dioxide 99.8% metals basis, 40nm, 金紅, 親油(KH-570處理)
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Titanium dioxide 99.8% metals basis, 20nm, 金紅, 親油(KH-570處理)
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Titanium dioxide 99.8% metals basis, 20nm, 金紅, 親油(KH-570處理)
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Thin layer Boron nitride nanoplates 片徑:1-5um 厚度:<5nm
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Thin layer Boron nitride nanoplates 片徑:1-5um 厚度:<5nm
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Thin layer Boron nitride nanoplates 片徑:1-5um 厚度:<5nm
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Thin Layer Nano MoS2 Dispersion 濃度: 0.1mg/ml, 溶劑: 乙醇
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Thin Layer Nano MoS2 Dispersion 濃度: 0.1mg/ml, 溶劑: 乙醇
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Thin Layer Nano MoS2 Dispersion 濃度: 0.1mg/ml, 溶劑: 水
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Thin Layer Nano MoS2 Dispersion 濃度: 0.1mg/ml, 溶劑: 水
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Ti2AlC Ceramic Material 純度(At.%):85±5

Ti2AlC Ceramic Material 純度(At.%):85±5

T698149 / 5G
CAS No.:12537-81-4
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Ti2AlC Ceramic Material 純度(At.%):85±5

Ti2AlC Ceramic Material 純度(At.%):85±5

T698149 / 1G
CAS No.:12537-81-4
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Ta4C3Tx(MXene)multilayernanosheet 厚度:50nm-1um

Ta4C3Tx(MXene)multilayernanosheet 厚度:50nm-1um

T698170 / 1G
CAS No.:12070-06-3
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Ta4AlC3(MAX)Phaseceramicmaterials 純度:90wt%

Ta4AlC3(MAX)Phaseceramicmaterials 純度:90wt%

T698173 / 5G
CAS No.:12070-06-3
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Ta4AlC3(MAX)Phaseceramicmaterials 純度:90wt%

Ta4AlC3(MAX)Phaseceramicmaterials 純度:90wt%

T698173 / 1G
CAS No.:12070-06-3
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Thin LayerMoS2Dispersion 濃度:1mg/ml溶劑:NMP,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:1mg/ml溶劑:NMP,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:1mg/ml溶劑:IPA,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:1mg/ml溶劑:IPA,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:5mg/ml溶劑:水,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:5mg/ml溶劑:乙醇,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:2mg/ml溶劑:水,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:1mg/ml溶劑:乙醇,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:1mg/ml溶劑:乙醇,穩定劑:LiOH
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Thin LayerMoS2Dispersion 濃度:1mg/ml溶劑:水穩定劑:LiOH
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ThinLayerMoS2 Powder 片徑:0.2-5μm,厚度:1-5nm

ThinLayerMoS2 Powder 片徑:0.2-5μm,厚度:1-5nm

T698200 / 1G
CAS No.:1317-33-5
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ThinLayerMoS2 Powder 片徑:0.2-5μm,厚度:1-5nm

ThinLayerMoS2 Powder 片徑:0.2-5μm,厚度:1-5nm

T698200 / 500MG
CAS No.:1317-33-5
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Thin LayerNanoMoS2Dispersion 濃度:5mg/ml,溶劑:水,穩定劑:LiOH
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Thin LayerNanoMoS2Dispersion 濃度:1mg/ml,溶劑:乙醇,穩定劑:LiOH
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Thin LayerNanoMoS2Dispersion 濃度:1mg/ml,溶劑:乙醇,穩定劑:LiOH
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Thin LayerNanoMoS2Dispersion 濃度:1mg/ml,溶劑:水,穩定劑:LiOH
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Thin LayerNanoMoS2Dispersion 濃度:1mg/ml,溶劑:水,穩定劑:LiOH
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TitanateNanotubes 純度:99%,直徑4-10nm

TitanateNanotubes 純度:99%,直徑4-10nm

T698225 / 1G
CAS No.:7439-89-6
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TitanateNanotubes 純度:99%,直徑4-10nm

TitanateNanotubes 純度:99%,直徑4-10nm

T698225 / 500MG
CAS No.:7439-89-6
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Ti3AlCN(MAX)Phase ceramic materials 片徑:1-35μm

Ti3AlCN(MAX)Phase ceramic materials 片徑:1-35μm

T698247 / 5G
CAS No.:12070-10-9
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