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Chemical materials

(R)-3-Phenylbutyric acid ≥97%

(R)-3-Phenylbutyric acid ≥97%

R465420-100MG / 100MG
CAS No.：772-14-5
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(R)-3-Phenylbutyric acid ≥97%

(R)-3-Phenylbutyric acid ≥97%

R465420-250MG / 250MG
CAS No.：772-14-5
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(R)-2-Amino-1,2,3,4-tetrahydronaphthalene-2-carboxylic acid ≥99%(HPLC)

(R)-2-Amino-1,2,3,4-tetrahydronaphthalene-2-carboxylic acid ≥99%(HPLC)

R465679-100MG / 100MG
CAS No.：104974-44-9
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(R)-2-Amino-1,2,3,4-tetrahydronaphthalene-2-carboxylic acid ≥99%(HPLC)

(R)-2-Amino-1,2,3,4-tetrahydronaphthalene-2-carboxylic acid ≥99%(HPLC)

R465679-500MG / 500MG
CAS No.：104974-44-9
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(R)-3-Methyl-2-ketopiperazine ≥99%(GC)

(R)-3-Methyl-2-ketopiperazine ≥99%(GC)

R465730-100MG / 100MG
CAS No.：922178-61-8
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(R)-3-Methyl-2-ketopiperazine ≥99%(GC)

(R)-3-Methyl-2-ketopiperazine ≥99%(GC)

R465730-500MG / 500MG
CAS No.：922178-61-8
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(R)-(+)-Tetrahydro-3-furylamine p-toluenesulfonate salt ≥99%

(R)-(+)-Tetrahydro-3-furylamine p-toluenesulfonate salt ≥99%

R465731-1G / 1G
CAS No.：111769-27-8
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(R)-(+)-Tetrahydro-3-furylamine p-toluenesulfonate salt ≥99%

(R)-(+)-Tetrahydro-3-furylamine p-toluenesulfonate salt ≥99%

R465731-250MG / 250MG
CAS No.：111769-27-8
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(R)-(+)-Tetrahydro-3-furylamine p-toluenesulfonate salt ≥99%

(R)-(+)-Tetrahydro-3-furylamine p-toluenesulfonate salt ≥99%

R465731-25G / 25G
CAS No.：111769-27-8
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(R)-(+)-Tetrahydro-3-furylamine p-toluenesulfonate salt ≥99%

(R)-(+)-Tetrahydro-3-furylamine p-toluenesulfonate salt ≥99%

R465731-5G / 5G
CAS No.：111769-27-8
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(1R,2R)-trans-2-Acetoxy-1-cyclopentanol ≥99%(GC), sum of enantiomers

(1R,2R)-trans-2-Acetoxy-1-cyclopentanol ≥99%(GC), sum of enantiomers

R465738-1ML / 1ML
CAS No.：105663-22-7
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(2R,3S)-(+)-3-(Benzyloxymethyl)oxirane-2-methanol 4-nitrobenzoic acid ester ≥99%(HPLC), sum of enantiomers

(2R,3S)-(+)-3-(Benzyloxymethyl)oxirane-2-methanol 4-nitrobenzoic acid ester ≥99%(HPLC), sum of enantiomers

R465748-5G / 5G
CAS No.：78469-86-0
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Rhodium(II) trimethylacetate, dimer ≥99.9% metals basis

Rhodium(II) trimethylacetate, dimer ≥99.9% metals basis

R465789-1G / 1G
CAS No.：62728-88-5
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(R)-(DTBM-SEGPHOS®)CuH solution 0.001M in toluene

(R)-(DTBM-SEGPHOS®)CuH solution 0.001M in toluene

R465819-10ML / 10ML
CAS No.：872517-04-9
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(R)-(+)-3-Methoxy-2-methyl-3-oxopropylzinc bromide solution 0.5M in THF

(R)-(+)-3-Methoxy-2-methyl-3-oxopropylzinc bromide solution 0.5M in THF

R465961-50ML / 50ML
CAS No.：343338-26-1
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(R)-(+)-2-Methyl-2-propanesulfinamide solution 1M in THF, 含 BHT作為穩定劑

(R)-(+)-2-Methyl-2-propanesulfinamide solution 1M in THF, 含 BHT作為穩定劑

R466074-10ML / 10ML
CAS No.：196929-78-9
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(R)-(+)-2-Methyl-2-propanesulfinamide solution 1M in THF, 含 BHT作為穩定劑

(R)-(+)-2-Methyl-2-propanesulfinamide solution 1M in THF, 含 BHT作為穩定劑

R466074-50ML / 50ML
CAS No.：196929-78-9
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Restriction Enzyme Buffer SB 10×

Restriction Enzyme Buffer SB 10×

R466190-5×1EA / 5×1EA
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(24R),24,25-Dihydroxyvitamin D₃-26,26,26,27,27,27-d₆ solution ≥98 atom% D,≥97%, 100μg/mL in ethanol

(24R),24,25-Dihydroxyvitamin D₃-26,26,26,27,27,27-d₆ solution ≥98 atom% D,≥97%, 100μg/mL in ethanol

R466251-1ML / 1ML
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Rink amine resin 100-200目,標記範圍：0.5-1.5 mmol/g N負載,1%與二乙烯基苯交聯

Rink amine resin 100-200目,標記範圍：0.5-1.5 mmol/g N負載,1%與二乙烯基苯交聯

R466300-1G / 1G
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Rink amine resin 100-200目,標記範圍：0.5-1.5 mmol/g N負載,1%與二乙烯基苯交聯

Rink amine resin 100-200目,標記範圍：0.5-1.5 mmol/g N負載,1%與二乙烯基苯交聯

R466300-5G / 5G
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Rink acid resin 100-200目,標記範圍：0.5-1.5 mmol/g負載,1%與二乙烯基苯交聯

Rink acid resin 100-200目,標記範圍：0.5-1.5 mmol/g負載,1%與二乙烯基苯交聯

R466302-5G / 5G
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Ramage ChemMatrix® resin 35-100目粒徑(濕篩)

Ramage ChemMatrix® resin 35-100目粒徑(濕篩)

R466578-1G / 1G
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Ramage ChemMatrix® resin 35-100目粒徑(濕篩)

Ramage ChemMatrix® resin 35-100目粒徑(濕篩)

R466578-5G / 5G
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Rhodium nanoparticles entrapped in aluminum hydroxide matrix preparation 5wt% loading

Rhodium nanoparticles entrapped in aluminum hydroxide matrix preparation 5wt% loading

R466620-1G / 1G
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Rhodium on activated alumina 5%銠(Rh)

Rhodium on activated alumina 5%銠(Rh)

R466674-1G / 1G
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Rhodium on activated alumina 5%銠(Rh)

Rhodium on activated alumina 5%銠(Rh)

R466674-5G / 5G
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Ruthenium 5% on activated charcoal 5%釕

Ruthenium 5% on activated charcoal 5%釕

R466676-1G / 1G
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Ruthenium 5% on alumina 5%釕

Ruthenium 5% on alumina 5%釕

R466677-5G / 5G
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Rink acid resin 50-100目,標記範圍：0.6-0.8 mmol/g負載,1%與二乙烯基苯交聯

Rink acid resin 50-100目,標記範圍：0.6-0.8 mmol/g負載,1%與二乙烯基苯交聯

R466724-5G / 5G
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Rink amide resin 50-90目,標記範圍：0.8-1.0 mmol/g N負載

Rink amide resin 50-90目,標記範圍：0.8-1.0 mmol/g N負載

R466726-1G / 1G
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(R)-α-Acryloyloxy-β,β-dimethyl-γ-butyrolactone ≥95%

(R)-α-Acryloyloxy-β,β-dimethyl-γ-butyrolactone ≥95%

R467027-5G / 5G
CAS No.：102096-60-6
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(R)-HuaCat ≥95%

(R)-HuaCat ≥95%

R467051-100MG / 100MG
CAS No.：1134192-85-0
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(R)-HuaCat ≥95%

(R)-HuaCat ≥95%

R467051-500MG / 500MG
CAS No.：1134192-85-0
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(R)-3,3′-Bis[3,5-bis(trifluoromethyl)phenyl]-1,1′-binaphthyl-2,2′-disulfonimide ≥95%

(R)-3,3′-Bis[3,5-bis(trifluoromethyl)phenyl]-1,1′-binaphthyl-2,2′-disulfonimide ≥95%

R467056-100MG / 100MG
CAS No.：1174193-01-1
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(R)-3,3′-Bis[3,5-bis(trifluoromethyl)phenyl]-1,1′-binaphthyl-2,2′-disulfonimide ≥95%

(R)-3,3′-Bis[3,5-bis(trifluoromethyl)phenyl]-1,1′-binaphthyl-2,2′-disulfonimide ≥95%

R467056-250MG / 250MG
CAS No.：1174193-01-1
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(R)-3,3′-Bis[3,5-bis(trifluoromethyl)phenyl]-1,1′-binaphthyl-2,2′-disulfonimide ≥95%

(R)-3,3′-Bis[3,5-bis(trifluoromethyl)phenyl]-1,1′-binaphthyl-2,2′-disulfonimide ≥95%

R467056-25MG / 25MG
CAS No.：1174193-01-1
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(R)-3,3′-Bis[3,5-bis(trifluoromethyl)phenyl]-1,1′-binaphthyl-2,2′-disulfonimide ≥95%

(R)-3,3′-Bis[3,5-bis(trifluoromethyl)phenyl]-1,1′-binaphthyl-2,2′-disulfonimide ≥95%

R467056-500MG / 500MG
CAS No.：1174193-01-1
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(R)-β-Fluorophenethylamine hydrochloride ≥95%

(R)-β-Fluorophenethylamine hydrochloride ≥95%

R467080-100MG / 100MG
CAS No.：127708-38-7
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(RS)-1-(2-Diphenylphosphino-1-naphthyl)isoquinoline ≥95%

(RS)-1-(2-Diphenylphosphino-1-naphthyl)isoquinoline ≥95%

R467129-100MG / 100MG
CAS No.：149245-03-4
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(RS)-1-(2-Diphenylphosphino-1-naphthyl)isoquinoline ≥95%

(RS)-1-(2-Diphenylphosphino-1-naphthyl)isoquinoline ≥95%

R467129-1G / 1G
CAS No.：149245-03-4
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(RS)-1-(2-Diphenylphosphino-1-naphthyl)isoquinoline ≥95%

(RS)-1-(2-Diphenylphosphino-1-naphthyl)isoquinoline ≥95%

R467129-250MG / 250MG
CAS No.：149245-03-4
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(RS)-1-(2-Diphenylphosphino-1-naphthyl)isoquinoline ≥95%

(RS)-1-(2-Diphenylphosphino-1-naphthyl)isoquinoline ≥95%

R467129-5G / 5G
CAS No.：149245-03-4
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(1R,4R)-1-((4-(Trifluoromethyl)phenyl)sulfonyl)bicyclo[2.1.0]pentane, (-)-R-enantiomer ≥95%

(1R,4R)-1-((4-(Trifluoromethyl)phenyl)sulfonyl)bicyclo[2.1.0]pentane, (-)-R-enantiomer ≥95%

R467189-100MG / 100MG
CAS No.：2074732-95-7
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(1R,4R)-1-((4-(Trifluoromethyl)phenyl)sulfonyl)bicyclo[2.1.0]pentane, (-)-R-enantiomer ≥95%

(1R,4R)-1-((4-(Trifluoromethyl)phenyl)sulfonyl)bicyclo[2.1.0]pentane, (-)-R-enantiomer ≥95%

R467189-250MG / 250MG
CAS No.：2074732-95-7
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rac-BINAP-Pd-G3 ≥95%

rac-BINAP-Pd-G3 ≥95%

R467198-10G / 10G
CAS No.：2151915-22-7
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rac-BINAP-Pd-G3 ≥95%

rac-BINAP-Pd-G3 ≥95%

R467198-1G / 1G
CAS No.：2151915-22-7
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rac-BINAP-Pd-G3 ≥95%

rac-BINAP-Pd-G3 ≥95%

R467198-250MG / 250MG
CAS No.：2151915-22-7
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rac-BINAP-Pd-G3 ≥95%

rac-BINAP-Pd-G3 ≥95%

R467198-5G / 5G
CAS No.：2151915-22-7
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(R)-(−)-1-Benzyloxy-3-(p-tosyloxy)-2-propanol ≥95%

(R)-(−)-1-Benzyloxy-3-(p-tosyloxy)-2-propanol ≥95%

R467209-5G / 5G
CAS No.：23214-66-6
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Telephone 03-494-6939
Fax 03-493-0687
Mail chungli@echochemical.com

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Address No. 16, Gongye Road, Toufen City, Miaoli County
Telephone 037-621-088
Fax 037-615-096
Mail miaoli@echochemical.com

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Address 15F-2, No. 218, Section 1, Wenxin Road, Nantun District, Taichung City
Telephone 04-2472-8859
Fax 04-2472-8825
Mail taichung@echochemical.com

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Address No. 33, Lane 63, Yanzhou 1st Street, Yongkang District, Tainan City
Telephone 06-243-6589
Fax 06-253-8208
Mail tainan@echochemical.com

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Address No. 479, Fengding Road, Fengshan District, Kaohsiung City
Telephone 07-753-9988
Fax 07-753-1958
Mail kaohsiung@echochemical.com
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